Semiconductor (Chip manufacturing)

SINO Crystal Electromechanical Installation Project

Construction time: June 15, 2020 - December 15, 2020

Building area: 82,000

Clean area: 25,000

Cleanliness standard: Class 1 - 100,000

Scope of contracting: building electromechanical installation

Project highlights:Our company undertakes the general contracting of electromechanical installation of the SINO Crystal Project, including crystal pulling, cutting, grinding and polishing buildings.

We have already been a leader in the semiconductor industry. As another semiconductor factory in China, we have also undertaken the preliminary design, which has laid a good foundation for the company's subsequent EPC of the large silicon wafer project.

Industry value:The SINO Crystal Project is the first large silicon wafer building in China that is completely invested and built by a private enterprise. The technology follows the internationally renowned brand, and is expected to break the situation that domestic large silicon wafers are completely dependent on imports.